This presentation will focus on our recent works pertaining to the high-resolution imaging of electron beam-sensitive materials using ultralow electron doses. The following technological advances will be discussed. First, the development of a suite of methods to address the challenges peculiar to low-dose TEM imaging, including rapid search for crystal zone axes, precise alignment of the image stack, and accurate determination of the defocus value, enables efficient imaging of electron beam-sensitive crystalline materials in the high-resolution TEM (HRTEM) mode. Second, integrated differential phase contrast STEM (iDPC-STEM) has proven to be an effective method for acquiring directly interpretable atomic-resolution images under low-dose conditions. Third, cryogenic focused ion beam (cryo-FIB) has demonstrated a unique power to prepare (S)TEM specimens for highly sensitive materials. Finally, I will share my views on the great potential of four-dimensional STEM (4D-STEM) in imaging highly electron beam-sensitive materials and provide preliminary results to demonstrate its feasibility.